silicon nitride film meaning in English
氮化硅薄膜
Examples
- The tested materials include ( 100 ) silicon wafer , ( 110 ) silicon wafer , poly - silicon thin film , dry oxidized silicon dioxide thin film , wet oxidized silicon dioxide thin film , lto thin film , standard lpcvd silicon nitride film , low stress lpcvd silicon nitride film , alumni nitride film , zinc oxide film etc . in the nanoindentation experiment of the single crystal silicon , two different mechanical phases are observed at different indentation depth
用纳米压入法对( 100 )单晶硅及( 110 )单晶硅、多晶硅薄膜、干氧薄膜、湿氧薄膜、 lto薄膜、标准氮化硅薄膜、低应力氮化硅薄膜、氮化铝薄膜、氧化锌薄膜等重要材料的杨氏模量和纳米硬度进行了系统地测量。报道了单晶硅在压入过程中观测到的两个力学相的变化。 - Samples are prepared at 1100 and 1200 for different time from 5 minutes to 4 hours to study direct - nitridation kinetics . the thickness of the silicon nitride films is measured by single - spot thickness system produced by filmetrics co . ltd . the direct - nitridation kinetics curve is attained and the maximum thickness of the silicon nitride film is about 50nm
为研究硅片氮化动力学，在1100和1200的温度下制备了从5分钟到4小时的各个氮化时间的样品，并采用了不同晶面取向的硅片和不同的硅片放置位置，用filmetrics公司生产的f20型膜厚测量仪测得各个样品的厚度，得到了实际的氮化动力学曲线和氮化薄膜的最终膜厚约为50纳米，氮气曲线较好地符合了气固反应类型的动力学曲线。